Effects of (002) β-Ta barrier on copper chemical mechanical polishing behavior

نویسندگان

  • Yu-Sheng Wang
  • Kei-Wei Chen
  • Min-Yuan Cheng
  • Wen-Hsi Lee
  • Ying-Lang Wang
چکیده

Available online 9 June 2012

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تاریخ انتشار 2013